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fdtd 3d electromagnetic simulator  (ANSYS inc)

 
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    ANSYS inc fdtd 3d electromagnetic simulator
    a AFM measurement performed on the surface of the DBR/DBR Schlieren cavity showing an average roughness R a = 2.6 nm. Scale bar, 2 μm. b TMCs of the reflectivity of DBR/DBR cavities with aligned 15% β-phase PFO at the design thickness for a resonance at 2.65 eV (red line) and assuming a 3 nm thickness increase over the design thickness (blue line). The calculation was performed for light polarized parallel to the alignment of the PFO transition dipole moment. c Calculated LP energy profile for a randomly generated film topography with a correlation length and amplitude matching the Schlieren cavity measured in ( a ). d <t>FDTD</t> simulation of the normalized squared electric field 1443 fs after excitation for the LP energy profile shown in ( c ). e Superposition of data from ( c and d ) illustrating how the electric field is confined to regions of lower LP energy, i.e., to thicker parts of the film.
    Fdtd 3d Electromagnetic Simulator, supplied by ANSYS inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/product/fdtd+3d+electromagnetic+simulator/pmc11743153-184-6-11?v=ANSYS+inc
    Average 90 stars, based on 1 article reviews
    fdtd 3d electromagnetic simulator - by Bioz Stars, 2026-08
    90/100 stars

    Images

    1) Product Images from "Schlieren texture and topography induced confinement in an organic exciton-polariton laser"

    Article Title: Schlieren texture and topography induced confinement in an organic exciton-polariton laser

    Journal: Nature Communications

    doi: 10.1038/s41467-025-55875-1

    a AFM measurement performed on the surface of the DBR/DBR Schlieren cavity showing an average roughness R a = 2.6 nm. Scale bar, 2 μm. b TMCs of the reflectivity of DBR/DBR cavities with aligned 15% β-phase PFO at the design thickness for a resonance at 2.65 eV (red line) and assuming a 3 nm thickness increase over the design thickness (blue line). The calculation was performed for light polarized parallel to the alignment of the PFO transition dipole moment. c Calculated LP energy profile for a randomly generated film topography with a correlation length and amplitude matching the Schlieren cavity measured in ( a ). d FDTD simulation of the normalized squared electric field 1443 fs after excitation for the LP energy profile shown in ( c ). e Superposition of data from ( c and d ) illustrating how the electric field is confined to regions of lower LP energy, i.e., to thicker parts of the film.
    Figure Legend Snippet: a AFM measurement performed on the surface of the DBR/DBR Schlieren cavity showing an average roughness R a = 2.6 nm. Scale bar, 2 μm. b TMCs of the reflectivity of DBR/DBR cavities with aligned 15% β-phase PFO at the design thickness for a resonance at 2.65 eV (red line) and assuming a 3 nm thickness increase over the design thickness (blue line). The calculation was performed for light polarized parallel to the alignment of the PFO transition dipole moment. c Calculated LP energy profile for a randomly generated film topography with a correlation length and amplitude matching the Schlieren cavity measured in ( a ). d FDTD simulation of the normalized squared electric field 1443 fs after excitation for the LP energy profile shown in ( c ). e Superposition of data from ( c and d ) illustrating how the electric field is confined to regions of lower LP energy, i.e., to thicker parts of the film.

    Techniques Used: Generated



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    Image Search Results


    a AFM measurement performed on the surface of the DBR/DBR Schlieren cavity showing an average roughness R a = 2.6 nm. Scale bar, 2 μm. b TMCs of the reflectivity of DBR/DBR cavities with aligned 15% β-phase PFO at the design thickness for a resonance at 2.65 eV (red line) and assuming a 3 nm thickness increase over the design thickness (blue line). The calculation was performed for light polarized parallel to the alignment of the PFO transition dipole moment. c Calculated LP energy profile for a randomly generated film topography with a correlation length and amplitude matching the Schlieren cavity measured in ( a ). d FDTD simulation of the normalized squared electric field 1443 fs after excitation for the LP energy profile shown in ( c ). e Superposition of data from ( c and d ) illustrating how the electric field is confined to regions of lower LP energy, i.e., to thicker parts of the film.

    Journal: Nature Communications

    Article Title: Schlieren texture and topography induced confinement in an organic exciton-polariton laser

    doi: 10.1038/s41467-025-55875-1

    Figure Lengend Snippet: a AFM measurement performed on the surface of the DBR/DBR Schlieren cavity showing an average roughness R a = 2.6 nm. Scale bar, 2 μm. b TMCs of the reflectivity of DBR/DBR cavities with aligned 15% β-phase PFO at the design thickness for a resonance at 2.65 eV (red line) and assuming a 3 nm thickness increase over the design thickness (blue line). The calculation was performed for light polarized parallel to the alignment of the PFO transition dipole moment. c Calculated LP energy profile for a randomly generated film topography with a correlation length and amplitude matching the Schlieren cavity measured in ( a ). d FDTD simulation of the normalized squared electric field 1443 fs after excitation for the LP energy profile shown in ( c ). e Superposition of data from ( c and d ) illustrating how the electric field is confined to regions of lower LP energy, i.e., to thicker parts of the film.

    Article Snippet: The simulations were performed using the FDTD 3D Electromagnetic Simulator from Lumerical-Ansys.

    Techniques: Generated